CreaPhys deposition

Specifications:
• Substrate size: 150 x 150 mm²
• 1D Dual Wedge tool • Rotatable Stage
• 2 Deposition chambers
− Chamber 1: 7 organic sources (5x 8cc, 2x 2cc), 1 triple source (0.5 cc), co-deposition
− Chamber 2: 4 high temperature sources 2 organic sources (1x 8cc, 1x 2cc)
• Plasma chamber (Ar and O2)
• In-situ IV-characterization
• automatic in-situ mask change
Required space:
height: Boxes only : 200 cm
Boxes with Motor: 290 cm
width: 540 cm depth: 260 cm

Possibilities:
- growth of multiple organic layers on substrates up to 150x150 mm
- deposition of metals and oxides (thermal evaporation)
- fabrication of up to 12 functional layers for OLEDs and solar cells
- doped layers (up to four components), molecularly doped and redox doped
- in-situ conductivity measurement for doped layers to adjust doping ratio